The research network "Groupement de Recherche" RAFALD (GDR 2009 «Réseau des Acteurs Français de l’ALD») was created by the CNRS on 01/01/2017.
This network aims to strengthen the links between groups already involved in ALD (Atomic Layer Deposition), as well as widen them towards new users, by sharing their skills and savoir-faire, organizing specific trainings; and promote exchanges among academic and industrial partners. This aims at seeding new projects, propose innovative materials and advanced processes in a « materials by design » strategy. Our ambition is to gather knowledge from "traditionnal" applications (microelectronics, energy) and also spread it towards new fields (biology, health, aeronautics, spatial, ...)
The GDR is organized through two main axis:
Precursor chemistry and processes, which covers all aspects of precursor design for thermal and plasma-enhanced systems, inputs from simulation, understanding of growth mecanism through instrumentation and the development of processes and innovative reactors;
Materials for current and emerging applications, where each material family (oxides, sulfides, metals, nitrides, ..) is considered for its potential application and analysed via a specific set of requirements.
The GDR2009 «RAFALD» is currently supported by several institutes of CNRS : INC (hosting institute), INSIS and INP via the involved teams or the "Sections du Comité National" (15, 11, 14, 8, 9, 10, 11, 3, 5). It is sponsored by the CNRS, the CEA and other specific institutions or industrial partners. It is managed by a Bureau of 16 personnes and gathers about 160 people (among which 110 permanent staff) working in 30 research teams from CNRS, CEA, Universities, Engineering schools, ...
The main actions of RAFALD are:
- Organisation of scientific event, and the workshop RAFALD in particular (1x/year, 3 days in November)
- Support mobilities between research teams
- Creation of a platfrom to facilitate exchanges
- Creation of a Industrial partner club