Blogs and websites
A non-exhaustive list of blogs and websites related to ALD : Atomic limits BALD Engineering Plasma ALD AtomicLayerDeposition
A non-exhaustive list of blogs and websites related to ALD : Atomic limits BALD Engineering Plasma ALD AtomicLayerDeposition
Two databases on ALD and ALE , listing different processes in a non-exhaustive way. Classified by elements. ALD database ALE database Database focusing on plasma enhanced atomic layer deposition www.plasma-ald.com
Here is an educational site giving access to courses on the ALD on the site of the Finnish University of Aalto, only in English or Finnish for the most learned. Open Learning
Le GDR RAFALD soutient la publication Open source et propose de couvrir des frais de publication open source. Toute publication publiée dans un journal à comité de lecture ET décrivant des travaux de recherche liés à l’ALD et qui découlent (de préférence) d’une collaboration entre deux laboratoires membres du GDR …
Le GDR RAFALD a acquis début 2019 un spectromètre OES (Optical Emission Spectroscopy). L’OES est une technique de caractérisation non destructive permettant l’analyse d’un système par le biais de sa signature optique. Cet équipement peut être utilisé lors de l’analyse des espèces présentes dans le plasma des réacteurs PE-ALD, pour …
Engineer techniques related to the principles and applications of the ALD technique (written by the GDR, the paper version can be obtained on request from management). Engineer Technics (French version only)
Zinc sulfide (obtained from elemental zinc and sulfur for electroluminescent panels) was one of the first film deposited by ALD in the 1970s. However, sulfide materials remain still underresearched and today represent less than 10% of ALD articles published each year. The needs for photovoltaic applications, but also for energy …
Each specific use of ALD for industry and academic research applications needs to have specific properties for thin film deposited, optimized throughput, as well as optimized costs, etc… Therefore many different ALD tools and set-up are used and innovative processes using ALD are developed every day. These innovations can come …
This topic will treat aspects like fundamental selection and evaluation of ALD metal organic precursors as well as the numerical modeling of their behavior in ALD conditions. Numerical modeling could be used to assess their thermal stability at the scale of the molecule/surface interaction or their transport and kinetic properties …
Spatial Atomic Layer Deposition (SALD) is a new process that is faster and less expensive than ALD, which opens new fiels of industrial applications for flexible and large substrates (OLEDs, flat displays, photovoltaic cells…). In Spatial ALD the classical sequence of precursor injection + purge is replaced by an alternative …